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Preparation of Bis(3-ethyl-3-methoxyoxetane)propyldiphenylsilane and Investigation of Its Cationic UV-Curing Material Properties

机译:双(3-乙基-3-甲氧基氧基氧乙烷)丙基二苯基硅烷的制备及其阳离子UV固化材料性能研究

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摘要

Precusor EHO(3-ethyl-3-hydroxymethyloxetane) was synthesized with diethyl carbonate and trihydroxypropane as the main raw materials. Intermediate AllyEHO(3-ethyl-3-allylmethoxyoxetane) was synthesized with 3-ethyl-3-hydroxymethyloxetane and allyl bromide as the main raw materials. Prepolymer bis[(3-ethyl-3-methoxyoxetane)propyl]diphenylsilane was synthesized with 3-ethyl-3-methoxyoxetane)propyl and diphenylsilane. Photoinitiator triarylsulfonium hexafluoroantimonate of 3% was added to the prepolymer, and a novel kind of the photosensitive resin was prepared. They were analyzed and characterized with FTIR and 1H-NMR. Photo-DSC examination revealed that the bis[(3-ethyl-3-methoxyoxetane)propyl]diphenylsilane has great photosensitivity. The thermal properties and mechanical properties of the photosensitive resin were examined by TGA and a microcomputer-controlled universal material testing machine, with thermal stabilities of up to 446 °C. The tensile strength was 75.5 MPa and the bending strength was 49.5 MPa. The light transmittance remained above 98%.
机译:用碳酸二乙酯和三羟基丙烷作为主要原料合成预使用的EHO(3-乙基-3-羟甲基氧基甲烷)。用3-乙基-3-羟甲氧基丁烷和烯丙基溴作为主要原料合成中间体allyeho(3-乙基-3-烯丙基甲氧基氧氧氧乙烷)。预聚物双[(3-乙基-3-甲氧二氧基甲烷)丙基]二苯基硅烷用3-乙基-3-甲氧基氧基甲烷合成)丙基和二苯基硅烷合成。将光引发剂三芳溴磺酸锂加入预聚物中的3%,并制备一种新颖的光敏树脂。分析并用FTIR和1H-NMR分析并表征它们。 Photo-DSC检查显示双[(3-乙基-3-甲氧基氧基甲烷)丙基]二苯基硅烷具有很大的光敏性。通过TGA和微型计算机控制的通用材料试验机检查光敏树脂的热性能和机械性能,热稳定性高达446°C。拉伸强度为75.5MPa,弯曲强度为49.5MPa。透光率保持在98%以上。

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