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Stable Metal–Organic Frameworks with Group4 Metals: Current Status and Trends

机译:带组的稳定的金属有机框架4种金属:现状和趋势

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摘要

Group 4 metal-based metal–organic frameworks (MIV-MOFs), including Ti-, Zr-, and Hf-based MOFs, are one of the most attractive classes of MOF materials owing to their superior chemical stability and structural tunability. Despite being a relatively new field, MIV-MOFs have attracted significant research attention in the past few years, leading to exciting advances in syntheses and applications. In this outlook, we start with a brief overview of the history and current status of MIV-MOFs, emphasizing the challenges encountered in their syntheses. The unique properties of MIV-MOFs are discussed, including their high chemical stability and strong tolerance toward defects. Particular emphasis is placed on defect engineering in Zr-MOFs which offers additional routes to tailor their functions. Photocatalysis of MIV-MOF is introduced as a representative example of their emerging applications. Finally, we conclude with the perspective of new opportunities in synthesis and defect engineering.
机译:第4组金属基金属有机框架(M IV -MOF),包括Ti-,Zr-和Hf基MOF,由于其优越的性能而成为最有吸引力的MOF材料类别之一。化学稳定性和结构可调性。尽管是相对较新的领域,但在过去的几年中,M IV -MOF引起了广泛的研究关注,从而在合成和应用方面取得了令人兴奋的进展。在这种前景下,我们首先简要概述了M IV -MOF的历史和现状,着重介绍了它们在合成中遇到的挑战。讨论了M IV -MOF的独特性质,包括其高化学稳定性和对缺陷的强耐受性。 Zr-MOF中的缺陷工程特别受重视,它提供了其他途径来调整其功能。介绍了M IV -MOF的光催化作用,作为其新兴应用的代表。最后,我们以综合和缺陷工程中的新机会的观点作为结束。

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