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Role of Substrate in Au Nanoparticle Decoration by Electroless Deposition

机译:基质在Au纳米粒子装饰中的作用通过无电沉积

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摘要

Decoration of nanostructures is a promising way of improving performances of nanomaterials. In particular, decoration with Au nanoparticles is considerably efficient in sensing and catalysis applications. Here, the mechanism of decoration with Au nanoparticles by means of low-cost electroless deposition (ELD) is investigated on different substrates, demonstrating largely different outcomes. ELD solution with Au potassium cyanide and sodium hypophosphite, at constant temperature (80 °C) and pH (7.5), is used to decorate by immersion metal (Ni) or semiconductor (Si, NiO) substrates, as well as NiO nanowalls. All substrates were pre-treated with a hydrazine hydrate bath. Scanning electron microscopy and Rutherford backscattering spectrometry were used to quantitatively analyze the amount, shape and size of deposited Au. Au nanoparticle decoration by ELD is greatly affected by the substrates, leading to a fast film deposition onto metallic substrate, or to a slow cluster (50–200 nm sized) formation on semiconducting substrate. Size and density of resulting Au clusters strongly depend on substrate material and morphology. Au ELD is shown to proceed through a galvanic displacement on Ni substrate, and it can be modeled with a local cell mechanism widely affected by the substrate conductivity at surface. These data are presented and discussed, allowing for cheap and reproducible Au nanoparticle decoration on several substrates.
机译:纳米结构的装饰是提高纳米材料性能的有希望的方法。特别是,用Au纳米粒子的装饰在感测和催化应用中具有显着有效。这里,在不同的基材上研究了通过低成本无电沉积(ELD)用低成本无电沉积(ELD)的装饰机制,展示了很大程度上不同的结果。用Au氰化钾和次磷酸钠,在恒定温度(80℃)和pH(7.5)中,使用浸渍金属(Ni)或半导体(Si,NiO)基板以及NiO纳瓦套管来装饰。所有底物用肼水合物浴预处理。扫描电子显微镜和Rutherford反向散射光谱法定量分析沉积Au的量,形状和尺寸。 ELD的Au纳米粒子装饰受衬底的影响,导致在金属基板上的快速膜沉积,或在半导体基材上的慢簇(50-200nm大小)形成。产生的Au集群的尺寸和密度强烈依赖于基材材料和形态。 Au Eld被示出通过Ni衬底进行电流位移,并且可以用局部电池机构对表面进行广泛影响的局部电池机构进行建模。提出和讨论了这些数据,允许在几个基板上进行廉价和可重复的Au纳米粒子装饰。

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