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Dependence of Photoresponsivity and On/Off Ratio on Quantum Dot Density in Quantum Dot Sensitized MoS

机译:光响应性和开/关比对量子点敏化MOS中量子点密度的依赖性

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摘要

Non-radiative energy transfer (NRET) from quantum dots (QDs) to monolayer MoS2 has been shown to greatly enhance the photoresponsivity of the MoS2 photodetector, lifting the limitations imposed by monolayer absorption thickness. Studies were often performed on a photodetector with a channel length of only a few μm and an active area of a few μm2. Here, we demonstrate a QD sensitized monolayer MoS2 photodetector with a large channel length of 40 μm and an active area of 0.13 mm2. The QD sensitizing coating greatly enhances photoresponsivity by 14-fold at 1.3 μW illumination power, as compared with a plain monolayer MoS2 photodetector without QD coating. The photoresponsivity enhancement increases as QD coating density increases. However, QD coating also causes dark current to increase due to charge doping from QD on MoS2. At low QD density, the increase of photocurrent is much larger than the increase of dark current, resulting in a significant enhancement of the signal on/off ratio. As QD density increases, the increase of photocurrent becomes slower than the increase of dark current. As a result, photoresponsivity increases, but the on/off ratio decreases. This inverse dependence on QD density is an important factor to consider in the QD sensitized photodetector design.
机译:已经示出了从量子点(QDS)到单层MOS2的非辐射能量转移(NRET)大大提高了MOS2光电探测器的光响应性,提升了通过单层吸收厚度施加的限制。通常在光电探测器上进行研究,沟道长度仅为几μm和几个μm2的有源面积。这里,我们展示了一种QD敏化的单层MOS2光电探测器,其具有40μm的大通道长度和0.13mm2的有效面积。与没有QD涂层的普通单层MOS2光电探测相比,QD敏化涂层极大地增强了14倍的光照功率,在1.3μW的照明功率上。随着QD涂层密度的增加,光响应性增强增加。然而,由于在MOS2上的QD电荷掺杂,QD涂层也导致暗电流增加。在低QD密度下,光电流的增加远大于暗电流的增加,导致信号开/关比的显着增强。随着QD密度的增加,光电流的增加变得比暗电流的增加慢。结果,光反应性增加,但开/关比降低。这种反向依赖QD密度是QD敏化光电探测器设计中考虑的重要因素。

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