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Graphene as a Schottky Barrier Contact to AlGaN/GaN Heterostructures

机译:石墨烯作为肖氏屏障接触到AlGaN / GaN异质结构

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摘要

Electrical and noise properties of graphene contacts to AlGaN/GaN heterostructures were studied experimentally. It was found that graphene on AlGaN forms a high-quality Schottky barrier with the barrier height dependent on the bias. The apparent barrier heights for this kind of Schottky diode were found to be relatively high, varying within the range of φb = (1.0–1.26) eV. AlGaN/GaN fin-shaped field-effect transistors (finFETs) with a graphene gate were fabricated and studied. These devices demonstrated ~8 order of magnitude on/off ratio, subthreshold slope of ~1.3, and low subthreshold current in the sub-picoamperes range. The effective trap density responsible for the 1/f low-frequency noise was found within the range of (1–5) · 1019 eV−1 cm−3. These values are of the same order of magnitude as reported earlier and in AlGaN/GaN transistors with Ni/Au Schottky gate studied as a reference in the current study. A good quality of graphene/AlGaN Schottky barrier diodes and AlGaN/GaN transistors opens the way for transparent GaN-based electronics and GaN-based devices exploring vertical electron transport in graphene.
机译:实验研究了石墨烯与AlGaN / GaN异质结构的电气和噪声性能。结果发现,AlGaN上的石墨烯形成高质量的肖氏屏障,依赖于偏压的屏障高度。发现这种肖特基二极管的表观屏障高度相对较高,变化在φB=(1.0-1.26)EV的范围内。制造和研究具有石墨烯栅极的AlGaN / GaN Fin形场效应晶体管(FinFET)。这些器件显示〜8级开/关比,亚剖腹产尺寸的亚阈值斜率,〜1.3的低亚阈值电流。负责1 / F低频噪声的有效陷阱密度在(1-5)·1019eV-1cm-3的范围内。这些值与早期报告的数量级和AlGaN / GaN晶体管以Ni / Au Schottky门作为当前研究中的参考进行了研究。 Graphene / AlGaN肖特基势垒二极管和AlGaN / GaN晶体管的良好质量为透明GaN的电子和GaN的器件开辟了探索石墨烯的垂直电子传输的方式。

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