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Refined Calibration Model for Improving the Orientation Precision of Electron Backscatter Diffraction Maps

机译:改进的校准模型用于提高电子背散射衍射图的定位精度

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摘要

For the precise determination of orientations in polycrystalline materials, electron backscatter diffraction (EBSD) requires a consistent calibration of the diffraction geometry in the scanning electron microscope (SEM). In the present paper, the variation of the projection center for the Kikuchi diffraction patterns which are measured by EBSD is calibrated using a projective transformation model for the SEM beam scan positions on the sample. Based on a full pattern matching approach between simulated and experimental Kikuchi patterns, individual projection center estimates are determined on a subgrid of the EBSD map, from which least-square fits to affine and projective transformations can be obtained. Reference measurements on single-crystalline silicon are used to quantify the orientation errors which result from different calibration models for the variation of the projection center.
机译:为了精确确定多晶材料中的取向,电子背散射衍射(EBSD)需要在扫描电子显微镜(SEM)中对衍射几何形状进行一致的校准。在本文中,对于样品上的SEM束扫描位置,使用投影变换模型对EBSD测量的菊池衍射图样的投影中心的变化进行了校准。基于模拟和实验菊池模式之间的完全模式匹配方法,可以在EBSD地图的子网格上确定各个投影中心的估计值,从中可以得到最小二乘拟合和仿射变换。使用单晶硅上的参考测量值来量化由投影中心变化的不同校准模型导致的定向误差。

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