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Ultra-Stable Silica Nanoparticles as Nano-Plugging Additive for Shale Exploitation in Harsh Environments

机译:超稳定二氧化硅纳米颗粒作为在恶劣环境下页岩开发中使用的纳米插入添加剂

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摘要

Owing to the harsh downhole environments, poor dispersion of silica at high salinity and high temperature can severely restrict its application as the nano-plugging agent in shale gas exploitation. The objective of this study is to improve salt tolerance and thermal stability of silica. Herein, silica was successfully functionalized with an anionic polymer (p SPMA) by SI-ATRP (surface-initiated atom transfer radical polymerization), named SiO -g-SPMA. The grafted pSPMA brushes on silica provided sufficient electrostatic repulsion and steric repulsion for stabilizing silica in a harsh environment. The modified silica (SiO -g-SPMA) had excellent colloidal stability at salinities up to 5.43 M NaCl (saturated brine) and standard API brine (8 wt% NaCl + 2 wt% CaCl ) for 30 days at room temperature. Simultaneously, the SiO -g-SPMA was stable at 170 °C for 24 h as well as stable in weakly alkali environment. Furthermore, the plugging performance of SiO -g-SPMA in water-based drilling fluids for low permeate reservoir reached to 78.25% when adding a small amount of 0.5 wt% SiO -g-SPMA, which effectively hindered the water invasion into formation and protected the reservoir.
机译:由于恶劣的井下环境,二氧化硅在高盐度和高温下的不良分散会严重限制其作为页岩气开采中的纳米堵漏剂的应用。这项研究的目的是提高二氧化硅的耐盐性和热稳定性。在此,通过称为SiO -g-SPMA的SI-ATRP(表面引发的原子转移自由基聚合),用阴离子聚合物(p SPMA)成功地将二氧化硅官能化。二氧化硅上的接枝pSPMA刷子可提供足够的静电排斥力和空间排斥力,以在恶劣的环境中稳定二氧化硅。在室温下,改性二氧化硅(SiO -g-SPMA)在高达5.43 M NaCl(饱和盐水)和标准API盐水(8 wt%NaCl + 2 wt%CaCl)的盐度下具有出色的胶体稳定性。同时,SiO -g-SPMA在170°C下稳定24小时,在弱碱性环境中也稳定。此外,少量添加0.5 wt%SiO -g-SPMA时,低渗透储层水基钻井液中SiO -g-SPMA的堵漏性能达到78.25%,有效地阻止了水的侵入和保护。水库。

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