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Effects of growth technique on the microstructure of CuInSe2 ternary semiconductor compound

机译:生长工艺对CuInSe2三元半导体化合物微观结构的影响

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摘要

X-ray diffraction (XRD) and Energy-dispersive X-ray fluorescence spectrometer (EDXRF) are employed to investigate the microstructure of bulk specimens grown through the Bridgman technique and traveling heater process, respectively. We investigate the lattice parameters, grain sizes, and microstrains of the two grown samples. For a crystal grown by the vertical Bridgeman method, the vacancy serves as an acceptor, resulting in p-type conduction, whereas the vacancy expected to serve as a donor, occurring in n-type conduction for the crystal grown via the traveling heater technique. The concentration of crystal grown via the VBM is determined to be p-type, whereas the concentration of that grown via the THM is n-type. Concerning crystal, the determined crystallite sizes obtained to be 165 and 182 nm for the VBM and THM, respectively.
机译:利用X射线衍射(XRD)和能量色散X射线荧光光谱仪(EDXRF)分别研究了通过Bridgman技术和行进加热过程生长的大块试样的显微结构。我们研究了两个生长样品的晶格参数,晶粒尺寸和微应变。对于通过垂直布里奇曼法生长的晶体,空位用作受体,导致p型传导,而预期的空位充当供体,对于通过行进加热器技术生长的晶体,其空位充当n型传导。通过VBM生长的晶体浓度确定为p型,而通过THM生长的晶体浓度为n型。关于晶体,对于VBM和THM,确定的微晶尺寸分别为165和182 nm。

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