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Deterministic placement of ultra-bright near-infrared color centers in arrays of silicon carbide micropillars

机译:在碳化硅微柱阵列中确定超亮近红外色心的位置

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摘要

We report the enhancement of the optical emission between 850 and 1400 nm of an ensemble of silicon mono-vacancies (V ), silicon and carbon divacancies (V V ), and nitrogen vacancies (N V ) in an n-type 4H-SiC array of micropillars. The micropillars have a length of ca. 4.5 μm and a diameter of ca. 740 nm, and were implanted with H ions to produce an ensemble of color centers at a depth of approximately 2 μm. The samples were in part annealed at different temperatures (750 and 900 °C) to selectively produce distinct color centers. For all these color centers we saw an enhancement of the photostable fluorescence emission of at least a factor of 6 using micro-photoluminescence systems. Using custom confocal microscopy setups, we characterized the emission of V measuring an enhancement by up to a factor of 20, and of N V with an enhancement up to a factor of 7. The experimental results are supported by finite element method simulations. Our study provides the pathway for device design and fabrication with an integrated ultra-bright ensemble of V and N V for in vivo imaging and sensing in the infrared.
机译:我们报告了在n型4H-SiC微柱阵列中硅单空位(V),硅和碳空位(VV)和氮空位(NV)的集合在850至1400 nm之间的光发射增强。微型支柱的长度约为。 4.5微米,直径约为740 nm,并注入H离子以在大约2μm的深度处产生一组色心。样品在不同的温度(750和900°C)下进行部分退火,以选择性地产生不同的色心。对于所有这些色心,我们看到使用微光致发光系统将光稳定的荧光发射提高了至少6倍。使用定制的共聚焦显微镜设置,我们表征了测量增强高达20的V的发射和表征增强高达7的N V的发射。有限元方法仿真支持了实验结果。我们的研究通过集成的V和N V超亮集成体为设备设计和制造提供了途径,用于红外体内成像和传感。

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