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Diastereoselection in the Formation of Spirocyclic Oxindoles by the Intramolecular Heck Reaction

机译:通过分子内Heck反应形成螺旋环吲哚的非对映选择性

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摘要

Diastereoselective double Heck cyclizations of cyclohexene diamides >1 and >3 form contiguous quaternary stereocenters, with diastereoselection being controlled by the trans diol-protecting group. In this, the first in a series of two papers, the origin of diastereoselection in the first ring closure step of these reactions is examined. Nine simplified analogues of >1 and >3 were synthesized and cyclized to discern what structural features are required to realize high diastereoselection in the first intramolecular Heck reaction. These studies show that high stereoselection (>20:1) does not arise from a single structural feature: it is seen only in substrates that contain both a trans acetonide and a tertiary amide substituent at C2. Two subtle factors appear to be involved: (1) Avoidance of eclipsing interactions between the forming C–C bond and the pseudoaxial hydrogen atom at C6, and between the pseudoequatorial hydrogen atom at C6 and the carbonyl carbon of the forming spirooxindole; (2) The vinylic amide substituent that is not involved in the insertion event, preferentially adopts a perpendicular conformation placing the sterically bulky NR2 over the alkene π-bond. Syn-pentane-like interactions between this substituent and C3 of the cyclohexene are avoided in the favored insertion topography. These two effects, when combined, produce a highly diastereoselective process.
机译:环己二酰胺> 1 和> 3 的非对映选择性双Heck环化反应形成连续的季立体中心,非对映选择性受反式二醇保护基团控制。本文是两篇系列文章中的第一篇,探讨了这些反应的第一个闭环步骤中的非对映选择性的起源。合成并环化了9个> 1 和> 3 的简化类似物,以识别在第一次分子内Heck反应中实现高非对映选择性需要哪些结构特征。这些研究表明,高立体选择性(> 20:1)并非源于单一结构特征:仅在同时含有反式丙酮化物和C2叔酰胺取代基的底物中才能看到。似乎涉及两个微妙的因素:(1)避免形成的C–C键与C6处的伪轴氢原子之间以及以及C6的伪赤道氢原子与所形成的螺氧杂吲哚之间的蚀相相互作用; (2)不参与插入事件的乙烯基酰胺取代基优选采用垂直构象,将空间大体积的NR 2置于烯烃的π键上。在有利的插入形貌中避免了该取代基与环己烯的C 3之间的类似正戊烷的相互作用。当将这两种作用结合时,会产生高度非对映选择性的过程。

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  • 年(卷),期 -1(71),7
  • 年度 -1
  • 页码 2587–2599
  • 总页数 37
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