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Hydroxyapatite induces spontaneous polymerization of model self-etch dental adhesives

机译:羟基磷灰石诱导模型自蚀刻牙科用胶粘剂的自发聚合

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摘要

The objective of this study is to report for the first time the spontaneous polymerization phenomenon of self-etch dental adhesives induced by hydroxylapatite (HAp). Model self-etch adhesives were prepared by using a monomer mixture of bis[2-(methacryloyloxy)ethyl] phosphate (2MP) with 2-hydroxyethyl methacrylate (HEMA). The initiator system consisted of camphorquinone (CQ, 0.022 mmol/g) and ethyl 4-dimethylaminobenzoate (4E, 0.022–0.088 mmol/g). HAp (2–8 wt.%) was added to the neat model adhesive. In a dark environment, the polymerization was monitored in-situ using ATR/FT-IR, and the mechanical properties of the polymerized adhesives were evaluated using nanoindentation technique. Results indicated that spontaneous polymerization was not observed in the absence of HAp. However, as different amounts of HAp were incorporated into the adhesives, spontaneous polymerization was induced. Higher HAp content led to higher degree of conversion (DC), higher rate of polymerization (RP) and shorter induction period (IP). In addition, higher 4E content also elevated DC and RP and reduced IP of the adhesives. Nanoindentation result suggested that the Young's modulus of the polymerized adhesives showed similar dependence on HAp and 4E contents. In summary, interaction with HAp could induce spontaneous polymerization of the model self-etch adhesives. This result provides important information for understanding the initiation mechanism of the self-etch adhesives, and may be of clinical significance to strengthen the adhesive/dentin interface based on the finding.
机译:这项研究的目的是第一次报道由羟基磷灰石(HAp)引起的自蚀刻牙科胶粘剂的自发聚合现象。通过使用双[2-(甲基丙烯酰氧基)乙基]磷酸酯(2MP)与甲基丙烯酸2-羟乙酯(HEMA)的单体混合物制备模型自蚀刻粘合剂。引发剂体系由樟脑醌(CQ,0.022 mmol / g)和4-二甲基氨基苯甲酸乙酯(4E,0.022-0.088 mmol / g)组成。将HAp(2–8 wt。%)添加到纯模型粘合剂中。在黑暗的环境中,使用ATR / FT-IR原位监测聚合反应,并使用纳米压痕技术评估聚合后的粘合剂的机械性能。结果表明在没有HAp的情况下没有观察到自发聚合。但是,由于将不同量的HAp掺入到粘合剂中,导致了自发聚合。较高的HAp含量导致较高的转化度(DC),较高的聚合速率(RP)和较短的诱导期(IP)。此外,较高的4E含量也会提高胶粘剂的DC和RP并降低IP。纳米压痕结果表明,聚合粘合剂的杨氏模量对HAp和4E含量的依赖性相似。总之,与HAp的相互作用可引起模型自蚀刻胶粘剂的自发聚合。该结果为理解自蚀刻胶粘剂的引发机理提供了重要的信息,并且基于该发现对于增强胶粘剂/牙本质界面可能具有临床意义。

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