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Side-by-Side Comparison of DNA Damage Induced by Low Energy Electrons and High Energy Photons with Solid TpTpT Trinucleotide

机译:低能电子和高能光子与固体TpTpT三核苷酸引起的DNA损伤的并排比较

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摘要

The genotoxic effects of high energy ionizing radiation have been largely attributed to the ionization of H2O leading to hydroxyl radicals (OH) and the ionization of DNA leading mostly to damage through base radical cations. However, the contribution of low energy electrons (LEEs; ≤ 10 eV), which involves sub-ionization events, has been considered to be less important than that of hydroxyl radicals and base radical cations. Here, we compare the ability of LEEs and high energy X-ray photons to induce DNA damage using dried thin films of TpTpT trinucleotide as a simple and representative model for DNA damage. The main radiation-induced damage of TpTpT as measured by HPLC-UV and LC-MS/MS analyses included thymine release (-Thy), strand breaks (pT, Tp, pTpT, TpTp and TpT), and the formation of base modifications (5,6-dihydrothymine (5,6-dhT), 5-hydroxymethyluracil (5-hmU) and 5-formyluracil (5-fU)). The global profile of products was very similar for both types of radiation indicating converging pathways of formation. The percent damage of thymine release, fragmentation and base modification was 20, 19 and 61 for high energy X-rays, respectively, compared to 35, 13 and 51 for LEEs (10 eV). Base release was significantly lower for X-rays. In both cases, phosphodiester bond cleavage gave mononucleotides (pT and Tp) and dinucleotides (pTpT and TpTp) containing a terminal phosphate as the major fragments. For base modifications, the ratio of reductive (5,6-dhT) to oxidative products (5-hmU plus 5-fU) was 0.9 for high energy X-rays compared to 1.7 for LEEs. These results indicate that LEEs give a similar profile of products compared to ionizing radiation.
机译:高能电离辐射的遗传毒性效应在很大程度上归因于H2O的电离导致羟基自由基(OH),而DNA的电离主要导致碱自由基阳离子的破坏。但是,低能电子(LEEs;≤10 eV)涉及亚电离事件的贡献被认为不如羟基自由基和碱自由基阳离子重要。在这里,我们比较了使用干燥的TpTpT三核苷酸薄膜作为DNA损伤的简单代表性模型,LEES和高能X射线光子诱导DNA损伤的能力。通过HPLC-UV和LC-MS / MS分析测得的TpTpT的主要辐射损伤包括胸腺嘧啶释放(-Thy),链断裂(pT,Tp,pTpT,TpTp和TpT)和碱基修饰的形成( 5,6-二氢胸腺嘧啶(5,6-dhT),5-羟甲基尿嘧啶(5-hmU)和5-甲酰基尿嘧啶(5-fU))。两种辐射类型的产品的总体概况非常相似,表明它们的形成途径正在收敛。高能X射线胸腺嘧啶释放,断裂和碱基修饰的损伤百分率分别为20%,19%和61%,而LEES(10eV)分别为35%,13%和51%。 X射线的基本释放量明显更低。在这两种情况下,磷酸二酯键裂解均产生了以末端磷酸酯为主要片段的单核苷酸(pT和Tp)和二核苷酸(pTpT和TpTp)。对于碱基修饰,高能X射线的还原性(5,6-dhT)与氧化性产物(5-hmU加5-fU)之比为0.9,而LEES为1.7。这些结果表明,LEE与电离辐射相比具有相似的产物轮廓。

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