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Synthesis and Photoluminescence Properties of Porous Silicon Nanowire Arrays

机译:多孔硅纳米线阵列的合成及光致发光性能

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摘要

Herein, we prepare vertical and single crystalline porous silicon nanowires (SiNWs) via a two-step metal-assisted electroless etching method. The porosity of the nanowires is restricted by etchant concentration, etching time and doping lever of the silicon wafer. The diffusion of silver ions could lead to the nucleation of silver nanoparticles on the nanowires and open new etching ways. Like porous silicon (PS), these porous nanowires also show excellent photoluminescence (PL) properties. The PL intensity increases with porosity, with an enhancement of about 100 times observed in our condition experiments. A “red-shift” of the PL peak is also found. Further studies prove that the PL spectrum should be decomposed into two elementary PL bands. The peak at 850 nm is the emission of the localized excitation in the nanoporous structure, while the 750-nm peak should be attributed to the surface-oxidized nanostructure. It could be confirmed from the Fourier transform infrared spectroscopy analyses. These porous SiNW arrays may be useful as the nanoscale optoelectronic devices.
机译:本文中,我们通过两步金属辅助化学蚀刻方法制备了垂直单晶多孔硅纳米线(SiNWs)。纳米线的孔隙度受蚀刻剂浓度,蚀刻时间和硅晶片的掺杂杆的限制。银离子的扩散可能导致纳米线上的银纳米颗粒成核,并开辟新的蚀刻方式。像多孔硅(PS)一样,这些多孔纳米线也显示出出色的光致发光(PL)特性。 PL强度随孔隙度的增加而增加,在我们的条件实验中观察到的强度提高了约100倍。还发现PL峰发生“红移”。进一步的研究证明,PL谱应分解为两个基本的PL波段。 850 nm处的峰是纳米多孔结构中局部激发的发射,而750 nm的峰应归因于表面氧化的纳米结构。这可以通过傅立叶变换红外光谱分析来证实。这些多孔SiNW阵列可以用作纳米级光电器件。

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