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Catalytic growth of ZnO nanostructures by r.f. magnetron sputtering

机译:r.f.催化生长ZnO纳米结构磁控溅射

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摘要

The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO) thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, with thicknesses close to the percolation threshold, are deposited by thermal evaporation in ultra high vacuum (UHV) conditions and subsequently annealed to form gold nanodroplets. The ZnO structures are subsequently deposited by r.f. magnetron sputtering in a UHV chamber, and possible morphological differences between the ZnO grown on top of the substrate and on the gold are investigated. The results indicate a moderate catalytic effect for a deposited gold underlayer of 4 nm, quite close to the gold thin film percolation thickness.
机译:研究了通过磁控溅射法在氧化锌(ZnO)薄膜生长之前沉积在衬底上的金籽粒的催化作用。为此,通过在超高真空(UHV)条件下进行热蒸发来沉积厚度接近渗滤阈值的选定超薄金层,然后对其进行退火以形成金纳米滴。随后通过r.f.沉积ZnO结构。研究了UHV室中的磁控溅射,以及在衬底顶部和金上生长的ZnO之间可能存在的形态差异。结果表明,对于4 nm沉积的金底层,催化效果中等,非常接近金薄膜的渗滤厚度。

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