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Formation mechanisms of nano and microcones by laser radiation on surfaces of Si Ge and SiGe crystals

机译:SiGe和SiGe晶体表面激光辐照形成纳米锥和微锥的机理

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摘要

In this work we study the mechanisms of laser radiation interaction with elementary semiconductors such as Si and Ge and their solid solution SiGe. As a result of this investigation, the mechanisms of nanocones and microcones formation on a surface of semiconductor were proposed. We have shown the possibility to control the size and the shape of cones both by the laser. The main reason for the formation of nanocones is the mechanical compressive stresses due to the atoms’ redistribution caused by the gradient of temperature induced by strongly absorbed laser radiation. According to our investigation, the nanocone formation mechanism in semiconductors is characterized by two stages. The first stage is characterized by formation of a p-n junction for elementary semiconductors or of a Ge/Si heterojunction for SiGe solid solution. The generation and redistribution of intrinsic point defects in elementary semiconductors and Ge atoms concentration on the irradiated surface of SiGe solid solution in temperature gradient field take place at this stage due to the thermogradient effect which is caused by strongly absorbed laser radiation. The second stage is characterized by formation of nanocones due to mechanical plastic deformation of the compressed Ge layer on Si. Moreover, a new 1D-graded band gap structure in elementary semiconductors due to quantum confinement effect was formed. For the formation of microcones Ni/Si structure was used. The mechanism of the formation of microcones is characterized by two stages as well. The first stage is the melting of Ni film after irradiation by laser beam and formation of Ni islands due to surface tension force. The second step is the melting of Ni and subsequent manifestations of Marangoni effect with the growth of microcones.
机译:在这项工作中,我们研究了激光辐射与基本半导体(例如Si和Ge)及其固溶体SiGe相互作用的机理。作为本研究的结果,提出了在半导体表面上形成纳米锥和微米锥的机理。我们已经展示了通过激光控制锥的大小和形状的可能性。形成纳米锥的主要原因是由于强烈吸收的激光辐射引起的温度梯度导致原子的重新分布而导致的机械压缩应力。根据我们的调查,半导体中纳米锥的形成机理分为两个阶段。第一步的特征是形成用于基本半导体的p-n结,或形成用于SiGe固溶体的Ge / Si异质结。由于强烈吸收的激光辐射引起的热梯度效应,在此阶段发生了元素半导体中本征点缺陷的产生和重新分布以及在温度梯度场中SiGe固溶体照射表面上的Ge原子浓度。第二阶段的特征是由于Si上压缩的Ge层的机械塑性变形而形成了纳米锥。此外,由于量子限制效应,在基本半导体中形成了新的一维渐变带隙结构。为了形成微锥,使用Ni / Si结构。微锥的形成机理也具有两个阶段的特征。第一步是激光束照射后镍膜的熔化和由于表面张力而形成的镍岛。第二步是镍的熔化以及随着微锥的生长而出现的马兰戈尼效应。

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