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Vertical-Injection AlGaInP LEDs with n-AlGaInP Nanopillars Fabricated by Self-Assembled ITO-Based Nanodots

机译:自组装基于ITO的纳米点制造的具有n-AlGaInP纳米柱的垂直注入AlGaInP LED

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摘要

The light output power of AlGaInP-based vertical-injection light-emitting diodes (VI-LEDs) can be enhanced significantly using n-AlGaInP nanopillars. n-AlGaInP nanopillars, ~200 nm in diameter, were produced using SiO2 nanopillars as an etching mask, which were fabricated from self-assembled tin-doped indium oxide (ITO)-based nanodots formed by the wet etching of as-deposited ITO films. The AlGaInP-based VI-LEDs with the n-AlGaInP nanopillars provided 25 % light output power enhancement compared to VI-LEDs with a surface-roughened n-AlGaInP because of the reduced total internal reflection by the nanopillars at the n-AlGaInP/air interface with a large refractive index difference of 1.9.
机译:使用n-AlGaInP纳米柱可以大大提高基于AlGaInP的垂直注入发光二极管(VI-LED)的光输出功率。使用SiO2纳米柱作为蚀刻掩模生产直径约200 nm的n-AlGaInP纳米柱,该纳米柱由通过湿法蚀刻沉积的ITO膜形成的自组装锡掺杂的氧化铟(ITO)基纳米点制成。具有n-AlGaInP纳米柱的基于AlGaInP的VI-LED与具有表面粗糙化的n-AlGaInP的VI-LED相比,提供了25%的光输出功率,因为​​纳米柱在n-AlGaInP /空气中的总内部反射减少了折射率差为1.9的界面。

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