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Novel hetero-layered materials with tunable direct band gaps by sandwiching different metal disulfides and diselenides

机译:通过将不同的金属二硫化物和二硒化物夹在中间可调节直接带隙的新型异质层材料

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摘要

Although bulk hexagonal phases of layered semiconducting transition metal dichalcogenides (STMD) such as MoS2, WS2, WSe2 and MoSe2 exhibit indirect band gaps, a mono-layer of STMD possesses a direct band gap which could be used in the construction of novel optoelectronic devices, catalysts, sensors and valleytronic components. Unfortunately, the direct band gap only occurs for mono-layered STMD. We have found, using first principles calculations, that by alternating individual layers of different STMD (MoS2, WS2, WSe2 and MoSe2) with particular stackings, it is possible to generate direct band gap bi-layers ranging from 0.79 eV to 1.157 eV. Interestingly, in this direct band gap, electrons and holes are physically separated and localized in different layers. We foresee that the alternation of different STMD would result in the fabrication of materials with unprecedented optical and physico-chemical properties that would need further experimental and theoretical investigations.
机译:尽管诸如MoS2,WS2,WSe2和MoSe2的层状半导体过渡金属二硫化碳(STMD)的本体六方相显示出间接带隙,但是STMD的单层具有直接带隙,可用于构造新型光电器件,催化剂,传感器和Valleytronic组件。不幸的是,直接带隙仅发生在单层STMD上。我们发现,使用第一原理计算,通过将具有不同堆叠的不同STMD的各个层(MoS2,WS2,WSe2和MoSe2)交替使用,可以生成范围为0.79 eV至1.157 eV的直接带隙双层。有趣的是,在该直接带隙中,电子和空穴在物理上分开并位于不同的层中。我们预见到,不同STMD的交替将导致具有前所未有的光学和物理化学性质的材料的制造,这需要进一步的实验和理论研究。

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