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The relationship between grain boundary structure defect mobility and grain boundary sink efficiency

机译:晶界结构缺陷迁移率和晶界沉效率之间的关系

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摘要

Nanocrystalline materials have received great attention due to their potential for improved functionality and have been proposed for extreme environments where the interfaces are expected to promote radiation tolerance. However, the precise role of the interfaces in modifying defect behavior is unclear. Using long-time simulations methods, we determine the mobility of defects and defect clusters at grain boundaries in Cu. We find that mobilities vary significantly with boundary structure and cluster size, with larger clusters exhibiting reduced mobility, and that interface sink efficiency depends on the kinetics of defects within the interface via the in-boundary annihilation rate of defects. Thus, sink efficiency is a strong function of defect mobility, which depends on boundary structure, a property that evolves with time. Further, defect mobility at boundaries can be slower than in the bulk, which has general implications for the properties of polycrystalline materials. Finally, we correlate defect energetics with the volumes of atomic sites at the boundary.
机译:纳米晶体材料由于其潜在的改善功能性而受到了极大的关注,并且已经被提议用于预期界面能够提高辐射耐受性的极端环境中。但是,接口在修改缺陷行为方面的确切作用尚不清楚。使用长时间的模拟方法,我们确定了铜中晶界的缺陷和缺陷簇的迁移率。我们发现迁移率随边界结构和团簇大小而显着变化,较大的团簇表现出降低的迁移率,并且界面沉效率取决于界面缺陷的动力学,界面动力学是通过缺陷的边界rate灭率实现的。因此,吸收效率是缺陷迁移率的重要函数,缺陷迁移率取决于边界结构,边界结构是随时间演变的。此外,边界处的缺陷迁移率可能比体中的慢,这对多晶材料的性能具有普遍的影响。最后,我们将缺陷能量与边界处原子位置的体积关联起来。

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