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Structures stabilities and electronic properties of defects in monolayer black phosphorus

机译:单层黑磷中缺陷的结构稳定性和电子性质

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摘要

The structures, stabilities, and electronic properties of monolayer black phosphorus (M-BP) with different kinds of defects are investigated within the frame of density-functional theory. All the possible configurations of defects in M-BP are explored, and the calculated results suggest that the stabilities of the configurations with different kinds of defects are greatly related to broken bonds, structural deformation and the character of the bonding. The configurations with two or three vacancies are energetically more favorable than the ones with a single vacancy. Meanwhile, the doping of two foreign atoms, such as sulfur, silicon or aluminum, is more stable than that of the corresponding single dopant. The electronic properties of M-BP are greatly affected by the types of defects. The single S-doped M-BP not only retains the character of a direct semiconductor, but it also can enlarge the band gap by 0.24 eV relative to the perfect one. Such results reveal that the defects not only greatly affect the electronic properties, but they also can be used as an effective way to modulate the band gap for the different applications of M-BP in electronic devices.
机译:在密度泛函理论的框架内,研究了具有不同缺陷的单层黑磷(M-BP)的结构,稳定性和电子性质。探索了M-BP中所有可能的缺陷构型,计算结果表明,具有不同缺陷类型的构型的稳定性与断裂键,结构变形和键合特性密切相关。具有两个或三个空位的配置在能量上比具有单个空位的配置更有利。同时,两个外来原子(例如硫,硅或铝)的掺杂比相应的单个掺杂物更稳定。缺陷类型极大地影响了M-BP的电子性能。单一的S掺杂M-BP不仅保留了直接半导体的特性,而且还可以将带隙相对于理想的带隙扩大0.24?eV。这些结果表明,这些缺陷不仅极大地影响了电子性能,而且还可以用作调节M-BP在电子设备中不同应用的带隙的有效方法。

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