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Room-temperature NH3 sensing of graphene oxide film and its enhanced response on the laser-textured silicon

机译:氧化石墨烯薄膜的室温NH3感测及其对激光织构硅的增强响应

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摘要

Electricity-based response to NH3 of graphene oxide (GO) is demonstrated at ppm level at room temperature. The GO film prepared on planar silicon substrate shows weak response when exposed to 50 ppm NH3, response time less than 30 s and recovery time about 100 s. More interestingly, the GO film coated on laser-textured silicon substrate shows significant enhancement for sensor response, and meanwhile response/recovery time is mainly preserved. Furthermore, a good response of textured GO film is detected in a dynamic range of 5–100 ppm NH3. The surface morphology and chemical bonds of the textured GO film are studied by scanning electron microscope (SEM), Fourier Transform Infrared (FT-IR) Spectrometer and X-ray Photoelectron Spectrometer (XPS), respectively. The NH3 response is attributed to the polar oxygen configurations of GO and the enhanced response is due to the richer oxygen configurations that stem from cobwebby microstructure of GO.
机译:在室温下,ppm级的氧化石墨烯(GO)对NH3的电响应被证明。在平面硅基板上制备的GO膜暴露于50µppm的NH3中时响应较弱,响应时间小于30µs,恢复时间约为100µs。更有趣的是,涂在激光纹理化的硅基板上的GO膜对传感器的响应表现出显着的增强,同时主要保留了响应/恢复时间。此外,在5–100 ppm NH3的动态范围内,可以检测到纹理化的GO膜的良好响应。分别通过扫描电子显微镜(SEM),傅立叶变换红外(FT-IR)光谱仪和X射线光电子能谱仪(XPS)研究了带纹理的GO膜的表面形态和化学键。 NH3响应归因于GO的极性氧构型,而增强的响应归因于GO的蜘蛛网微结构所致的富氧构型。

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