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X-ray induced damage of B4C-coated bilayer materials under various irradiation conditions

机译:在各种照射条件下X射线诱导B4C涂层双层材料的损伤

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摘要

In this report, we analyse X-ray induced damage of B4C-coated bilayer materials under various irradiation geometries, following the conditions of our experiment performed at the free-electron-laser facility SACLA. We start with the discussion of structural damage in solids and damage threshold doses for the experimental system components: B4C, SiC, Mo and Si. Later, we analyze the irradiation of the experimentally tested coated bilayer systems under two different incidence conditions of a linearly polarized X-ray pulse: (i) grazing incidence, and (ii) normal incidence, in order to compare quantitatively the effect of the pulse incidence on the radiation tolerance of both systems. For that purpose, we propose a simple theoretical model utilizing properties of hard X-ray propagation and absorption in irradiated materials and of the following electron transport. With this model, we overcome the bottleneck problem of large spatial scales, inaccessible for any existing first-principle-based simulation tools due to their computational limitations for large systems. Predictions for damage thresholds obtained with the model agree well with the available experimental data. In particular, they confirm that two coatings tested: 15 nm B4C/20 nm Mo on silicon wafer and 15 nm B4C/50 nm SiC on silicon wafer can sustain X-ray irradiation at the fluences up to ~10 μJ/μm2, when exposed to linearly polarized 10 keV X-ray pulse at a grazing incidence angle of 3 mrad. Below we present the corresponding theoretical analysis. Potential applications of our approach for design and radiation tolerance tests of multilayer components within X-ray free-electron-laser optics are indicated.
机译:在本报告中,我们按照在自由电子激光设备SACLA上进行的实验条件,分析了在各种照射几何形状下B4C涂层双层材料的X射线诱导损伤。我们首先讨论固体的结构损伤和实验系统组件(B4C,SiC,Mo和Si)的损伤阈值剂量。随后,我们分析了在线性偏振X射线脉冲的两种不同入射条件下经过实验测试的涂层双层系统的辐照:(i)掠入射和(ii)垂直入射,以便定量比较脉冲的影响这两个系统的辐射耐受性有关。为此,我们提出了一个简单的理论模型,该模型利用了硬X射线在被辐照材料中的传播和吸收特性以及随后的电子传输特性。使用该模型,我们克服了大空间尺度的瓶颈问题,由于其对大型系统的计算限制,因此任何现有的基于第一原理的仿真工具都无法访问。通过模型获得的损伤阈值预测与可用的实验数据非常吻合。特别是,他们确认已测试的两种涂层:硅片上的15 nm B4C / 20 nm Mo和硅片上的15 nm B4C / 50 nm SiC可以维持X射线辐射,注量最高可达〜10μJ/μm 2 ,当以3 mrad的掠入射角暴露于线偏振10 keV X射线脉冲时。下面我们给出相应的理论分析。指出了我们的方法在X射线自由电子激光光学器件中多层组件的设计和辐射耐受性测试中的潜在应用。

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