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High-temperature thermoelectric transport at small scales: Thermal generation transport and recombination of minority carriers

机译:小规模高温热电运输:少数载流子的热产生运输和重组

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摘要

Thermoelectric transport in semiconductors is usually considered under small thermal gradients and when it is dominated by the role of the majority carriers. Not much is known about effects that arise under the large thermal gradients that can be established in high-temperature, small-scale electronic devices. Here, we report a surprisingly large asymmetry in self-heating of symmetric highly doped silicon microwires with the hottest region shifted along the direction of minority carrier flow. We show that at sufficiently high temperatures and strong thermal gradients (~1 Km), energy transport by generation, transport and recombination of minority carriers along these structures becomes very significant and overcomes convective energy transport by majority carriers in the opposite direction. These results are important for high-temperature nanoelectronics such as emerging phase-change memory devices which also employ highly doped semiconducting materials and in which local temperatures reach ~1000 K and thermal gradients reach ~10–100 Km.
机译:半导体中的热电传输通常被认为是在较小的热梯度下,并且在多数载流子的作用下占主导地位。对于在高温,小型电子设备中可以建立的大热梯度下产生的影响,人们知之甚少。在这里,我们报告了对称的高掺杂硅微线自热中的惊人大不对称性,其中最热的区域沿着少数载流子的方向移动。我们表明,在足够高的温度和强烈的热梯度(〜1 K / nm)下,少数载流子沿着这些结构的产生,转移和复合的能量传输变得非常重要,并克服了多数载流子在相反方向上的对流能量传输。这些结果对于高温纳米电子学非常重要,例如新兴的相变存储器件,它们也采用高掺杂半导体材料,其中局部温度达到〜1000 K,热梯度达到〜10–100 K / nm。

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