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Surface Diffusion Directed Growth of Anisotropic Graphene Domains on Different Copper Lattices

机译:不同铜晶格上各向异性石墨烯域的表面扩散定向生长

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摘要

Anisotropic graphene domains are of significant interest since the electronic properties of pristine graphene strongly depend on its size, shape, and edge structures. In this work, considering that the growth of graphene domains is governable by the dynamics of the graphene-substrate interface during growth, we investigated the shape and defects of graphene domains grown on copper lattices with different indices by chemical vapor deposition of methane at either low pressure or atmospheric pressure. Computational modeling identified that the crystallographic orientation of copper strongly influences the shape of the graphene at low pressure, yet does not play a critical role at atmospheric pressure. Moreover, the defects that have been previously observed in the center of four-lobed graphene domains grown under low pressure conditions were demonstrated for the first time to be caused by a lattice mismatch between graphene and the copper substrate.
机译:由于原始石墨烯的电子性质很大程度上取决于其尺寸,形状和边缘结构,因此各向异性石墨烯域引起了人们的极大兴趣。在这项工作中,考虑到石墨烯域的生长受生长过程中石墨烯-基底界面的动力学支配,我们研究了通过化学气相沉积甲烷在较低温度下在具有不同指数的铜晶格上生长的石墨烯域的形状和缺陷压力或大气压。计算模型表明,铜的晶体取向在低压下会严重影响石墨烯的形状,但在大气压下不会发挥关键作用。此外,首次证明了在低压条件下生长的四叶状石墨烯畴的中心已经观察到的缺陷是由石墨烯和铜基板之间的晶格失配引起的。

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