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Emission of direct-gap band in germanium with Ge-GeSn layers on one-dimensional structure

机译:一维结构上具有Ge-GeSn层的锗的直接能带的发射

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摘要

In our experiment, it was observed that the emission of direct-gap band in germanium with Ge-GeSn layers on one-dimensional (1D) structure. The results of experiment and calculation demonstrate that the uniaxial tensile strain in the (111) and (110) direction can efficiently transform Ge to a direct bandgap material with the bandgap energy useful for technological application. It is interested that under the tensile strain from Ge-GeSn layers on 1D structure in which the uniaxial strain could be obtained by curved layer (CL) effect, the two bandgaps EΓg and ELg in the (111) direction become nearly equal at 0.83 eV related to the emission of direct-gap band near 1500 nm in the experiments. It is discovered that the red-shift of the peaks from 1500 nm to 1600 nm occurs with change of the uniaxial tensile strain, which proves that the peaks come from the emission of direct-gap band.
机译:在我们的实验中,观察到一维(1D)结构上具有Ge-GeSn层的锗中的直接隙带的发射。实验和计算结果表明,沿(111)和(110)方向的单轴拉伸应变可以有效地将Ge转变为具有带隙能量的直接带隙材料,该带隙能量可用于技术应用。有趣的是,在可以通过弯曲层(CL)效应获得单轴应变的一维结构上的Ge-GeSn层的拉伸应变下,(111)方向上的两个带隙EΓg和ELg几乎等于0.83 eV与实验中1500 nm附近的直接隙带的发射有关。研究发现,随着单轴拉伸应变的变化,峰值从1500 nm到1600 nm发生红移,这证明了这些峰来自于直接能带的发射。

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