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Optical thermometry based on level anticrossing in silicon carbide

机译:基于水平反交叉的碳化硅光学测温法

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摘要

We report a giant thermal shift of 2.1 MHz/K related to the excited-state zero-field splitting in the silicon vacancy centers in 4H silicon carbide. It is obtained from the indirect observation of the optically detected magnetic resonance in the excited state using the ground state as an ancilla. Alternatively, relative variations of the zero-field splitting for small temperature differences can be detected without application of radiofrequency fields, by simply monitoring the photoluminescence intensity in the vicinity of the level anticrossing. This effect results in an all-optical thermometry technique with temperature sensitivity of 100 mK/Hz1/2 for a detection volume of approximately 10−6 mm3. In contrast, the zero-field splitting in the ground state does not reveal detectable temperature shift. Using these properties, an integrated magnetic field and temperature sensor can be implemented on the same center.
机译:我们报道了与4H碳化硅中的硅空位中心的激发态零场分裂有关的2.1 MHz / K的巨大热位移。它是通过将基态作为辅助条件,对激发态的光学检测磁共振进行间接观察而获得的。可替代地,通过简单地监测水平反交点附近的光致发光强度,可以在不施加射频场的情况下检测到针对小温度差的零场分裂的相对变化。这种效果导致了一种全光学测温技术,其温度灵敏度为100 mK / Hz 1/2 ,检测体积约为10 -6 mm 3 < / sup>。相反,在基态下的零场分裂并未显示出可检测到的温度漂移。利用这些特性,可以在同一中心上实现集成的磁场和温度传感器。

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