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Two-Dimensional Large Gap Topological Insulators with Tunable Rashba Spin-Orbit Coupling in Group-IV films

机译:IV组膜中具有可调Rashba自旋轨道耦合的二维大间隙拓扑绝缘子

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摘要

The coexistence of nontrivial topology and giant Rashba splitting, however, has rare been observed in two-dimensional (2D) films, limiting severely its potential applications at room temperature. Here, we through first-principles calculations to propose a series of inversion-asymmetric group-IV films, ABZ2 (A ≠ B = Si, Ge, Sn, Pb; Z = F, Cl, Br), whose stability are confirmed by phonon spectrum calculations. The analyses of electronic structures reveal that they are intrinsic 2D TIs with a bulk gap as large as 0.74 eV, except for GeSiF2, SnSiCl2, GeSiCl2 and GeSiBr2 monolayers which can transform from normal to topological phases under appropriate tensile strain of 4, 4, 5, and 4%, respectively. The nontrivial topology is identified by Z2 topological invariant together with helical edge states, as well as the berry curvature of these systems. Another prominent intriguing feature is the giant Rashba spin splitting with a magnitude reaching 0.15 eV, the largest value reported in 2D films so far. The tunability of Rashba SOC and band topology can be realized through achievable compressive/tensile strains (−4 ~ 6%). Also, the BaTe semiconductor is an ideal substrate for growing ABZ2 films without destroying their nontrivial topology.
机译:但是,在二维(2D)薄膜中很少观察到非平凡拓扑结构和巨型Rashba分裂的共存,这严重限制了其在室温下的潜在应用。在这里,我们通过第一性原理计算,提出了一系列反转非对称IV族薄膜ABZ2(A≠B = Si,Ge,Sn,Pb; Z = F,Cl,Br),其稳定性得到了声子的证实。频谱计算。电子结构分析表明,它们是本征二维TI,其体隙高达0.74 eV,但GeSiF2,SnSiCl2,GeSiCl2和GeSiBr2单层除外,它们可以在4、4、5、4的适当拉伸应变下从正相转变为拓扑相和分别为4%。非平凡的拓扑结构由Z2拓扑不变性以及螺旋边缘状态以及这些系统的浆果曲率标识。另一个引人入胜的有趣特征是巨大的Rashba自旋分裂,幅度达到0.15 eV,是迄今为止在2D胶片中报道的最大值。 Rashba SOC和频带拓扑的可调谐性可以通过可实现的压缩/拉伸应变(-4〜6%)实现。另外,BaTe半导体是生长ABZ2膜而不破坏其平凡拓扑的理想衬底。

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