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Graphene Enhanced Secondary Ion Mass Spectrometry (GESIMS)

机译:石墨烯增强的二次离子质谱(GESIMS)

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摘要

The following invention - Graphene Enhanced Secondary Ion Mass Spectrometry - (pending European patent application no. EP 16461554.4) is related to a method of analysing a solid substrate by means of Secondary Ion Mass Spectrometry (SIMS). It comprises the steps of providing a graphene layer over the substrate surface and analysing ejected secondary anions through mass spectrometry analysis. The graphene layer acts as a kind of filament that emits a lot of secondary electrons during the experiment which significantly increases the negative ionization probability and thus the intensity of the SIMS signal can be more than two orders of magnitude higher than that of a similar sample without graphene. The method is particularly useful for the analysis of surfaces, 2D materials and ultra-thin films. The intensity of dopants and contamination signals can be enhanced up to 35 times, which approaches the detection limit of ~1015 atoms/cm 3, otherwise unreachable in a standard static SIMS analysis.
机译:下列发明-石墨烯增强的二次离子质谱-(待审欧洲专利申请号EP 16461554.4)涉及一种通过二次离子质谱(SIMS)分析固体基质的方法。它包括以下步骤:在衬底表面上提供石墨烯层,并通过质谱分析来分析喷射的次级阴离子。石墨烯层是一种细丝,在实验过程中会发出大量二次电子,这大大增加了负电离几率,因此,SIMS信号的强度可以比没有该样品的类似样品高两个数量级。石墨烯。该方法对于分析表面,2D材料和超薄薄膜特别有用。掺杂剂和污染信号的强度可以提高35倍,接近〜10 15 原子/ cm 3 的检测极限,否则在标准静态SIMS中无法达到分析。

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