首页> 美国卫生研究院文献>Scientific Reports >Promotion of the excited electron transfer over Ni- and Co -sulfide co-doped g-C3N4 photocatalyst (g-C3N4/NixCo1−xS2) for hydrogen Production under visible light irradiation
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Promotion of the excited electron transfer over Ni- and Co -sulfide co-doped g-C3N4 photocatalyst (g-C3N4/NixCo1−xS2) for hydrogen Production under visible light irradiation

机译:促进Ni和Co硫化物共掺杂的g-C3N4光催化剂(g-C3N4 / NixCo1-xS2)上的激发电子转移以在可见光照射下制氢

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摘要

A Ni- and Co- sulfide co-doped g-C3N4 photocatalyst (g-C3N4/NixCo1−xS2) was prepared by hydrothermal method and this photocatalyst, namely, g-C3N4/NixCo1−xS2 shown excellent photocatalytic properties due to the special structure of Ni-Co-S with boundary different exposure to active site of transition metal-metal (Ni-Co) active planes. With the introduction of Co atoms, the H2 production amount reached the maximum about 400.81 μmol under continuous visible light irradiation for 4 hours based on the efficiently charge separation and greatly improved electron transfer resulted from the presence of sufficient active exposure at the boundary. The serial studies shown that the existence of Ni-Co-S structure over g-C3N4 active surface is the key factor of activity affections by means of several characterizations such as SEM, XRD, XPS diffuse reflectance etc. and the results of which were in good agreement with each other. A possible reaction mechanism over eosin Y-sensitized g-C3N4/NixCo1−xS2 photocatalyst under visible light irradiation was proposed.
机译:通过水热法制备了Ni-和Co-硫化物共掺杂的g-C3N4光催化剂(g-C3N4 / NixCo1-xS2),由于其特殊的结构,该光催化剂g-C3N4 / NixCo1-xS2显示出优异的光催化性能。边界不同暴露于过渡金属-金属(Ni-Co)活性平面的活性位的Ni-Co-S的特征。随着钴原子的引入,由于有效的电荷分离和在边界处有足够的活性暴露而导致的电子转移大大提高,在连续可见光照射下持续4小时,H 2的产生量达到了约400.81μmol的最大值。一系列研究表明,g-C3N4活性表面上存在Ni-Co-S结构是通过SEM,XRD,XPS漫反射等多种表征影响活性的关键因素,其结果是:彼此之间的良好协议。曙红Y致敏的g-C3N 4 / Ni x Co 1-x S 2 的可能反应机理提出了可见光照射下的光催化剂。

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