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Band structure engineered layered metals for low-loss plasmonics

机译:带结构工程分层金属用于低损耗等离子体

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摘要

Plasmonics currently faces the problem of seemingly inevitable optical losses occurring in the metallic components that challenges the implementation of essentially any application. In this work, we show that Ohmic losses are reduced in certain layered metals, such as the transition metal dichalcogenide TaS2, due to an extraordinarily small density of states for scattering in the near-IR originating from their special electronic band structure. On the basis of this observation, we propose a new class of band structure engineered van der Waals layered metals composed of hexagonal transition metal chalcogenide-halide layers with greatly suppressed intrinsic losses. Using first-principles calculations, we show that the suppression of optical losses lead to improved performance for thin-film waveguiding and transformation optics.
机译:当前,等离子技术面临着在金属部件中出现不可避免的光学损失的问题,这对基本上任何应用的实施都提出了挑战。在这项工作中,我们表明在某些层状金属(例如过渡金属二卤化钨TaS2)中,由于由其特殊的电子能带结构引起的近红外散射态密度极小,其欧姆损耗得以降低。在此基础上,我们提出了一种新型的带状结构工程范德华层状金属,该层状金属由六角形过渡金属硫属元素卤化物-卤化物层组成,固有损耗被大大抑制。使用第一性原理计算,我们显示出对光学损耗的抑制导致薄膜波导和变换光学器件的性能提高。

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