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Enhanced electron dephasing in three-dimensional topological insulators

机译:三维拓扑绝缘体中增强的电子移相

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摘要

Study of the dephasing in electronic systems is not only important for probing the nature of their ground states, but also crucial to harnessing the quantum coherence for information processing. In contrast to well-studied conventional metals and semiconductors, it remains unclear which mechanism is mainly responsible for electron dephasing in three-dimensional topological insulators (TIs). Here, we report on using weak antilocalization effect to measure the dephasing rates in highly tunable (Bi,Sb)2Te3 thin films. As the transport is varied from a bulk-conducting regime to surface-dominant transport, the dephasing rate is observed to evolve from a linear temperature dependence to a sublinear power-law dependence. Although the former is consistent with the Nyquist electron-electron interactions commonly seen in ordinary 2D systems, the latter leads to enhanced electron dephasing at low temperatures and is attributed to the coupling between the surface states and the localized charge puddles in the bulk of 3D TIs.
机译:研究电子系统中的相移不仅对探测其基态的性质很重要,而且对于利用量子相干性进行信息处理也至关重要。与经过深入研究的常规金属和半导体相反,目前尚不清楚哪种机理主要负责三维拓扑绝缘体(TI)中的电子移相。在这里,我们报道了使用弱的抗局部化作用来测量高度可调的(Bi,Sb)2Te3薄膜中的相移速率。随着传输过程从体态传输变为表面主导传输,可以观察到移相速率从线性温度依赖性演变为亚线性幂律依赖性。尽管前者与普通2D系统中常见的奈奎斯特电子-电子相互作用相一致,但后者导致低温下电子的相移增强,并且归因于大部分3D TI中表面态与局部电荷坑之间的耦合。 。

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