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Bipolar Cu/HfO2/p++ Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing

机译:溶胶-凝胶旋涂法双极Cu / HfO2 / p ++ Si忆阻器及其在环境传感中的应用

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摘要

In this paper, the memristive switching behavior of Cu/ HfO2/p++ Si devices fabricated by an organic-polymer-assisted sol-gel spin-coating method, coupled with post-annealing and shadow-mask metal sputtering steps, is examined. HfO2 layers of about 190 nm and 80 nm, are established using cost-effective spin-coating method, at deposition speeds of 2000 and 4000 rotations per minute (RPM), respectively. For two types of devices, the memristive characteristics (Von, Ion, and Vreset) and device-to-device electrical repeatability are primarily discussed in correlation with the oxide layer uniformity and thickness. The devices presented in this work exhibit an electroforming free and bipolar memory-resistive switching behavior that is typical of an Electrochemical Metallization (ECM) I-V fingerprint. The sample devices deposited at 4000 RPM generally show less variation in electrical performance parameters compared to those prepared at halved spin-coating speed. Typically, the samples prepared at 4000 RPM (n = 8) display a mean switching voltage Von of 3.0 V (±0.3) and mean reset voltage Vreset of −1.1 V (±0.5) over 50 consecutive sweep cycles. These devices exhibit a large Roff/Ron window (up to 104), and sufficient electrical endurance and retention properties to be further examined for radiation sensing. As they exhibit less statistical uncertainty compared to the samples fabricated at 2000 RPM, the devices prepared at 4000 RPM are tested for the detection of soft gamma rays (emitted from low-activity Cs-137 and Am-241 radioactive sources), by assessing the variation in the on-state resistance value upon exposure. The analysis of the probability distributions of the logarithmic Ron values measured over repeated ON-OFF cycles, before, during and after exposing the devices to radiation, demonstrate a statistical difference. These results pave the way for the fabrication and development of cost-effective soft-gamma ray detectors.
机译:本文通过有机聚合物辅助溶胶-凝胶旋涂,后退火和荫罩相结合的方法制备了Cu / HfO2 / p ++ Si器件的忆阻开关行为检查金属溅射步骤。使用具有成本效益的旋涂方法,分别以2000和4000转/分钟(RPM)的沉积速度建立约190 nm和80 nm的HfO2层。对于两种类型的器件,将主要与氧化物层的均匀性和厚度相关地讨论忆阻特性(Von,离子和Vreset)以及器件间的电重复性。在这项工作中介绍的设备表现出一种无电铸和双极耐记忆开关行为,这是电化学金属化(ECM)I-V指纹的典型特征。与以减半旋涂速度制备的样品装置相比,以4000 RPM沉积的样品装置通常在电气性能参数上显示出较小的变化。通常,以4000 RPM(n == 8)制备的样品在50个连续扫描周期内显示的平均开关电压Von为3.0 V(±0.3),平均复位电压Vreset为-1.1 V(±0.5)。这些设备具有大的Roff / Ron窗口(高达10 4 ),并且具有足够的电气耐久性和保持特性,需要进一步检查以进行辐射感测。由于与2000 RPM时制造的样品相比,它们具有较低的统计不确定性,因此通过评估辐射强度,测试了以4000 RPM制备的设备检测软伽玛射线(由低活性Cs-137和Am-241放射源发出)的能力。曝光后导通电阻值的变化。在将设备暴露于辐射之前,之中和之后,通过重复的ON-OFF循环测量的对数Ron值的概率分布分析显示出统计学差异。这些结果为制造和开发具有成本效益的软伽马射线探测器铺平了道路。

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