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Interferometric hard x-ray phase contrast imaging at 204 nm grating period

机译:204 nm光栅周期的干涉式硬X射线相衬成像

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摘要

We report on hard x-ray phase contrast imaging experiments using a grating interferometer of approximately 1/10th the grating period achieved in previous studies. We designed the gratings as a staircase array of multilayer stacks which are fabricated in a single thin film deposition process. We performed the experiments at 19 keV x-ray energy and 0.8 μm pixel resolution. The small grating period resulted in clear separation of different diffraction orders and multiple images on the detector. A slitted beam was used to remove overlap of the images from the different diffraction orders. The phase contrast images showed detailed features as small as 10 μm, and demonstrated the feasibility of high resolution x-ray phase contrast imaging with nanometer scale gratings.
机译:我们报告的硬X射线相衬成像实验使用的光栅干涉仪大约是以前研究中达到的光栅周期的1/10。我们将光栅设计为多层堆叠的阶梯阵列,这些堆叠是在单个薄膜沉积过程中制造的。我们以19 keV X射线能量和0.8μm像素分辨率进行了实验。较小的光栅周期导致不同衍射级的清晰分离和检测器上的多个图像。使用裂隙光束从不同的衍射级去除图像的重叠。相衬图像显示了小至10μm的详细特征,并证明了使用纳米级光栅进行高分辨率X射线相衬成像的可行性。

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