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Group-13 and group-15 doping of germanane

机译:锗烷的第13组和第15组掺杂

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摘要

Germanane, a hydrogen-terminated graphane analogue of germanium has generated interest as a potential 2D electronic material. However, the incorporation and retention of extrinsic dopant atoms in the lattice, to tune the electronic properties, remains a significant challenge. Here, we show that the group-13 element Ga and the group-15 element As, can be successfully doped into a precursor CaGe2 phase, and remain intact in the lattice after the topotactic deintercalation, using HCl, to form GeH. After deintercalation, a maximum of 1.1% As and 2.3% Ga can be substituted into the germanium lattice. Electronic transport properties of single flakes show that incorporation of dopants leads to a reduction of resistance of more than three orders of magnitude in H2O-containing atmosphere after As doping. After doping with Ga, the reduction is more than six orders of magnitude, but with significant hysteretic behavior, indicative of water-activation of dopants on the surface. Only Ga-doped germanane remains activated under vacuum, and also exhibits minimal hysteretic behavior while the sheet resistance is reduced by more than four orders of magnitude. These Ga- and As-doped germanane materials start to oxidize after one to four days in ambient atmosphere. Overall, this work demonstrates that extrinsic doping with Ga is a viable pathway towards accessing stable electronic behavior in graphane analogues of germanium.
机译:锗的氢封端石墨烯类似物锗烷作为潜在的二维电子材料引起了人们的兴趣。然而,外来掺杂原子在晶格中的结合和保留以调节电子性能仍然是一项重大挑战。在这里,我们表明,第13族元素Ga和第15族元素As可以成功地掺杂到前体CaGe2相中,并且在使用HCl进行完全脱插后形成GeH之后,在晶格中保持完整。脱嵌后,最多可将1.1%的As和2.3%的Ga代入锗晶格中。单个薄片的电子传输性能表明,掺入掺杂剂会导致砷掺杂后在含H2O的气氛中电阻降低三个数量级以上。用Ga掺杂后,还原度超过6个数量级,但具有显着的磁滞行为,表明表面上的掺杂剂被水活化。仅Ga掺杂的锗烷在真空下保持活化,并且还表现出最小的滞后行为,而薄层电阻降低了四个数量级以上。这些Ga和As掺杂的锗烷材料在环境大气中经过1-4天后开始氧化。总的来说,这项工作表明,外加Ga是在锗的石墨烷类似物中获得稳定电子行为的可行途径。

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