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Broadband photoresponse data of transparent all-oxide photovoltaics of ZnO/NiO

机译:ZnO / NiO透明全氧化物光伏电池的宽带光响应数据

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摘要

In this data article, the properties of all transparent metal oxide of ZnO/NiO heterostructure “Transparent all-oxide photovoltaics and broadband high-speed energy-efficient optoelectronics” [1] are presented by characteristics of ZnO and NiO layers, open circuit voltage decay (OCVD), broadband light with intensity dependent current-voltage plots. The device performances under the effect of various optical excitation of intermediated-band, bound excitonic, free-excitonic and band-to-band are presented. The ZnO/NiO heterostructure direction grown on ITO/glass substrate by large area sputtering method [1] was characterized by UV–visible plots and scanning electron microscope (SEM). Carrier lifetime using OCVD of ZnO/NiO devices with carbon paint metal contact is presented. Prolonged open circuit voltage plots under UV light intensity are shown for stability and repeatability studies. I–V characteristics of ZnO/NiO heterostructure under the light wavelength from 623 nm to 365 nm are presented for energy efficient broadband optoelectronics.
机译:在此数据文章中,通过ZnO和NiO层的特性,开路电压衰减来表示ZnO / NiO异质结构的所有透明金属氧化物的特性“透明的全氧化物光伏电池和宽带高速节能光电” [1]。 (OCVD),宽带光具有与强度有关的电流-电压图。给出了在中频带,束缚激子,自由激子和带间的各种光激发作用下的器件性能。通过紫外可见图和扫描电子显微镜(SEM)表征了通过大面积溅射方法[1]在ITO /玻璃基板上生长的ZnO / NiO异质结构方向。提出了使用带有碳漆金属触点的ZnO / NiO器件的OCVD方法进行的载流子寿命。显示了在紫外光强度下的长时间开路电压图,用于稳定性和可重复性研究。 ZnO / NiO异质结构在623 nm至365 nm的光波长下的I–V特性被提出,用于高能效宽带光电。

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