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A novel method for synthesis of α-Si3N4 nanowires by sol–gel route

机译:溶胶-凝胶法合成α-Si3N4纳米线的新方法

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摘要

Silicon nitride (Si3 N4) nanowires have been prepared by carbothermal reduction followed by the nitridation (CTRN) of silica gel containing ultrafine excess carbon obtained by the decomposition of dextrose over the temperature range of 1200–1350 °C. This innovative process involves repeated evacuation followed by purging of nitrogen gas so that the interconnected nanopores of the gel are filled with nitrogen gas prior to heat treatment. During heat treatment at higher temperatures, the presence of nitrogen gas in the nanopores of the gel starts the CTRN reaction simultaneously throughout the bulk of the gel, leading to the formation of Si3 N4 nanowires. The in situ generated ultrafine carbon obtained by the decomposition of dextrose decreases the partial pressure of oxygen in the system to stabilize the nanowires. The nanowires synthesized by this process are of ∼500 nm diameter and ∼0.2 mm length. The product was characterized by scanning electron microscope (SEM), energy dispersive x-ray analysis (EDX), x-ray diffraction (XRD) and infrared (IR) spectra.
机译:氮化硅(Si3 N4)纳米线是通过碳热还原,然后在1200–1350°C的温度范围内通过葡萄糖分解而制得的,其中含有超细过量碳的硅胶氮化(CTRN)。这种创新的方法包括反复抽空,然后吹扫氮气,以便在热处理之前,凝胶中相互连接的纳米孔充满氮气。在较高温度下进行热处理期间,凝胶纳米孔中存在氮气,同时在整个凝胶体中同时启动CTRN反应,导致形成Si3 N4纳米线。通过右旋糖分解获得的原位生成的超细碳降低了系统中氧气的分压,从而稳定了纳米线。通过该方法合成的纳米线的直径约为500 nm,长度约为0.2 mm。通过扫描电子显微镜(SEM),能量色散X射线分析(EDX),X射线衍射(XRD)和红外(IR)光谱对产品进行表征。

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