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Tunable Electronic and Topological Properties of Germanene by Functional Group Modification

机译:通过官能团修饰可调节锗烯的电子和拓扑性质

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摘要

Electronic and topological properties of two-dimensional germanene modified by functional group X (X = H, F, OH, CH3) at full coverage are studied with first-principles calculation. Without considering the effect of spin-orbit coupling (SOC), all functionalized configurations become semiconductors, removing the Dirac cone at K point in pristine germanene. We also find that their band gaps can be especially well tuned by an external strain. When the SOC is switched on, GeX (X = H, CH3) is a normal insulator and strain leads to a phase transition to a topological insulator (TI) phase. However, GeX (X = F, OH) becomes a TI with a large gap of 0.19 eV for X = F and 0.24 eV for X = OH, even without external strains. More interestingly, when all these functionalized monolayers form a bilayer structure, semiconductor-metal states are observed. All these results suggest a possible route of modulating the electronic properties of germanene and promote applications in nanoelectronics.
机译:用第一性原理计算研究了被官能团X(X = H,F,OH,CH3)修饰的二维锗烯在全覆盖下的电子和拓扑性质。在不考虑自旋轨道耦合(SOC)的影响的情况下,所有功能化配置都变为半导体,从而去除了原始锗烯K点处的狄拉克锥。我们还发现,它们的带隙可以通过外部应变来特别好地调节。当SOC接通时,GeX(X = H,CH3)是正常的绝缘体,应变导致相变到拓扑绝缘体(TI)相。但是,即使没有外部应变,GeX(X = F,OH)也会变成一个具有较大间隙的TI(对于X = F为0.19 eV,对于X = OH为0.24 eV)。更有趣的是,当所有这些功能化的单层都形成双层结构时,观察到半导体-金属态。所有这些结果表明调节锗电子性质的可能途径并促进其在纳米电子学中的应用。

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