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In-Plane Optical Beam Collimation Using a Three-Dimensional Curved MEMS Mirror

机译:使用三维曲面MEMS镜的平面内光束准直

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摘要

The collimation of free-space light propagating in-plane with respect to the substrate is an important performance factor in optical microelectromechanical systems (MEMS). This is usually carried out by integrating micro lenses into the system, which increases the cost of fabrication/assembly in addition to limiting the wavelength working range of the system imposed by the dispersion characteristic of the lenses. In this work we demonstrate optical fiber light collimation using a silicon micromachined three-dimensional curved mirror. Sensitivity to micromachining and fiber alignment tolerance is shown to be low enough by restricting the ratio between the mirror focal length and the optical beam Rayleigh range below 5. The three-dimensional curvature of the mirror is designed to be astigmatic and controlled by a process combining deep, reactive ion etching and isotropic etching of silicon. The effect of the micromachining surface roughness on the collimated beam profile is investigated using a Fourier optics approach for different values of root-mean-squared (RMS) roughness and correlation length. The isotropic etching step of the structure is characterized and optimized for the optical-grade surface requirement. The experimental optical results show a beam-waist ratio of about 4.25 and a corresponding 12-dB improvement in diffraction loss, in good agreement with theory. This type of micromirror can be monolithically integrated into lensless microoptoelectromechanical systems (MOEMS), improving their performance in many different applications.
机译:相对于基板在平面内传播的自由空间光的准直是光学微机电系统(MEMS)中的重要性能因素。这通常是通过将微透镜集成到系统中来执行的,这不仅增加了制造/组装的成本,而且还限制了由透镜的色散特性所引起的系统的波长工作范围。在这项工作中,我们演示了使用硅微机械加工的三维曲面镜对光纤的准直。通过将反射镜焦距和光束瑞利范围的比率限制在5以下,可以证明对微加工的敏感性和光纤对准公差足够低。反射镜的三维曲率设计为散光并通过工艺组合来控制硅的深层反应离子刻蚀和各向同性刻蚀对于不同的均方根(RMS)粗糙度值和相关长度,使用傅里叶光学方法研究了微加工表面粗糙度对准直光束轮廓的影响。对结构的各向同性蚀刻步骤进行了表征,并针对光学级表面要求进行了优化。实验光学结果表明,束腰比约为4.25,衍射损耗相应提高了12dB,与理论相符。这种类型的微镜可以单片集成到无透镜微光机电系统(MOEMS)中,从而改善其在许多不同应用中的性能。

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