Inverse Moth Eye Nanostructures with Enhanced Antireflectionand Contamination Resistance

摘要

Moth-eye-inspired nanostructures are highly useful for antireflection applications. However, block copolymer micelle lithography, an effective method to prepare moth eye nanopillars, can only be used on a limited choice of substrates. Another drawback of nanopillar substrates is that contamination is easily absorbed, thereby reducing transmittance. The production of antireflective surfaces that are contamination-resistant or that can be cleaned easily without the loss of optical properties remains challenging. Here, we describe an approach for creating inverse moth eye nanostructures on other optical substrates than the most commonly used fused silica. We demonstrate its feasibility by fabricating a borosilicate substrate with inverse nanostructures on both sides. The etching of nanoholes on both sides of the substrate improves its transmittance by 8%, thereby surpassing the highest increase of transmittance yet to be obtained with nanopillars on fused silica. More importantly, the substrate with inverse moth eye nanostructures is more robust against contaminations than the substrates with nanopillars. No significantdecrease in performance is observed after five cycles of repeatedcontamination and cleaning. Our approach is transferable to a varietyof optical materials, rendering our antireflection nanostructuresideal for applications in touch devices such as touch screens anddisplay panels.