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Randomness and Statistical Laws of Indentation-Induced Pop-Out in Single Crystal Silicon

机译:单晶硅压痕弹出的随机性和统计规律

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摘要

Randomness and discreteness for appearance of pop-out of the single crystal silicon with a (100) orientation were studied by a self-made indentation device. For a given maximum penetration load, the load Ppo for appearance of pop-out fluctuates in a relatively large range, which makes it hard to study the effect of the loading/unloading rate on the load Ppo. Experimental results with different maximum penetration loads indicate that the critical penetration load for appearance of pop-out is in the range of 15 mN~20 mN for the current used single crystal silicon. For a given maximum penetration load, the load Ppo for appearance of pop-out seems random and discrete, but in the point of statistics, it has an obviously increasing trend with increase of the maximum penetration load and also the fraction Ppo/Pmax approximately keeps in the range of 0.2~0.5 for different maximum penetration loads changing from 15 mN to 150 mN.
机译:用自制压痕装置研究了取向为(100)的单晶硅的弹出现象的随机性和离散性。对于给定的最大穿透载荷,出现弹出物的载荷Ppo在相对较大的范围内波动,这使得很难研究加载/卸载速率对载荷Ppo的影响。不同最大穿透载荷的实验结果表明,对于当前使用的单晶硅,弹出弹出的临界穿透载荷在15 mN〜20 mN的范围内。对于给定的最大穿透载荷,弹跳出现的载荷Ppo似乎是随机且离散的,但从统计角度来看,随着最大穿透载荷的增加,载荷Ppo呈明显增加的趋势,并且Ppo / Pmax的分数大致保持不变对于从15 mN到150 mN的不同最大穿透载荷,其最大载荷范围为0.2〜0.5。

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