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Alloying and Structure of Ultrathin Gallium Filmson the (111) and (110) Surfaces of Palladium

机译:超薄镓膜的合金化和结构在钯的(111)和(110)表面上

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摘要

Growth, thermal stability, and structure of ultrathin gallium films on Pd(111) and Pd(110) are investigated by low-energy ion scattering and low-energy electron diffraction. Common to both surface orientations are growth of disordered Ga films at coverages of a few monolayers (T = 150 K), onset of alloy formation at low temperatures (T ≈ 200 K), and formation of a metastable, mostly disordered 1:1 surface alloy at temperatures around 400–500 K. At higher temperatures a Ga surface fraction of ∼0.3 is slightly stabilized on Pd(111), which we suggest to be related to the formation of Pd2Ga bulk-like films. While on Pd(110) only a Pd-up/Ga-down buckled surface was observed, an inversion of buckling was observed on Pd(111) upon heating. Similarities and differences to the related Zn/Pd system are discussed.
机译:通过低能离子散射和低能电子衍射研究了Pd(111)和Pd(110)上超薄镓膜的生长,热稳定性和结构。两种表面取向的共同点是无序Ga膜在几个单层的覆盖范围内生长(T = 150 K),在低温下开始形成合金(T≈200 K)以及形成亚稳态的,大部分为无序1:1表面合金在大约400–500 K的温度下生长。在更高的温度下,Pd(111)上Ga表面的分数约为0.3,这与Pd2Ga块状薄膜的形成有关。在Pd(110)上仅观察到Pd向上/ Ga向下弯曲的表面,而加热时在Pd(111)上观察到屈曲的反转。讨论了与相关Zn / Pd系统的异同。

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