MPCVD法制备石墨烯的研究进展

摘要

微波等离子体化学气相沉积（MPCVD）法是近年来发展起来的制备石墨烯的新方法，具有低温生长、基底材料选择广泛、容易掺杂等优点，逐渐成为制备高质量石墨烯的主要方法。首先通过分析制备石墨烯的几种主要方法（微机械剥离法、SiC外延生长法、化学剥离法、化学气相沉积法）得出MPCVD法相对于其他方法的优势，然后综述了MPCVD法制备石墨烯的研究进展，最后简要列举了MPCVD法制备的石墨烯的应用并对MPCVD法制备石墨烯的发展趋势进行了展望。%In recent years,microwave plasma chemical vapor deposition(MPCVD) has been developed as a new method to prepare graphene. With the advantages of low-temperature growth,a wide choice of substrate material,and dop-ing easy,MPCVD gradually becomes the main method for preparation of high-quality graphene. Firstly,several main methods(micro-mechanical peeling,SiC epitaxial growth,chemical stripping,and chemical vapor deposition)for synthe-sizing graphene were analysed and compared with MPCVD,finding that MPCVD has clear superiority. Moreover,re-search progress of MPCVD graphene was overviewed. Lastly,the applications of MPCVD graphene were listed briefly and the development trend of it was previewed.