钴基高温合金GH5605的恒温氧化行为研究

摘要

The high temperature oxidation of Co-based GH5605 under static and constant temperatures were studied by means of the modern analytical tools OM, XRD & SEM/EDX. Through the test, the oxidation kinetics curves and oxidation rates of the alloy, are got the micrograph and phase components of oxidation scale. The nonoxidizability and the oxidation mechanism have been discussed. The results show that the Co-base GH5605 at 750 ～ 950 ℃ oxidation kinetics followed the parabolic law, the main oxide film is Cr2 03; the oxide film didn' t spall;the phenomenon of internal oxidation didn' t exist during the oxidation process, and the alloy can be used at the high temperature no more than 1 100℃.%通过采用现代分析手段OM、XRD 及 SEM/EDX,研究了钴基高温合金GH5605的高温静态空气氧化行为.得到了该合金的氧化动力学曲线、氧化膜形貌及其相组成,评价了合金的抗氧化性能并分析了合金氧化机理.结果表明:钴基高温合金GH5605在750～950℃时氧化动力学遵循抛物线规律,生成的氧化膜以Cr203为主,无氧化膜剥落;合金氧化过程中无内氧化现象发生;该合金可满足1 100℃以下高温使用要求.