掺氮TiO2-xNx薄膜托槽的细胞相容性研究

摘要

)Nitrogen-doped TiO2-xNx dims were produced on the MBT straight wire appliance by the method of radio frequency magnetron sputtering and the cytocomptibility were evaluated by means of MTT methods.microscope observation,SEM and fluorescent staining method. According to MTT assay, the level of cytotoxicity of nitrogen-doped TiO2-xNx films was grade 0, and the percentage of cells proliferation of the two groups showed no statistical difference(P>0. 05). The SEM photo showed the L929 cells grew well on the surface of the films. The nuclei was bright yellow-green fluorescence, cytoplasm was green fluorescent on the surface of the films under fluorescence microscope. The films showed a good cell compatibility.%采用射频磁控溅射法在普通MBT直丝弓金属托槽表面制备了锐钛矿相掺氮TiO2-xNx薄膜,通过MTT比色法、细胞形态学观察、扫描电镜及荧光染色法评价薄膜托槽的细胞学性能.结果表明,掺氮TiO2-xNx薄膜托槽的细胞毒性为0级,与对照组相比,薄膜托槽组细胞的相对增殖率差异无统计学意义(P＞0.05)；扫描电镜图像显示细胞在薄膜托槽表面贴壁生长良好；荧光显微镜观察显示粘附在材料表面的细胞其细胞核呈亮黄绿色荧光,细胞质呈绿色荧光,细胞生长良好.由此证明掺氮TiO2-xNx薄膜托槽具有良好的细胞相容性.