首页> 中文期刊> 《漳州师范学院学报(自然科学版)》 >水溶液中三价铬离子配位机理研究

水溶液中三价铬离子配位机理研究

         

摘要

采用新型低毒、可常温操作的三价铬镀铬工艺替代六价铬镀铬是大势所趋,已成为镀铬行业迫切需要攻克的、带有行业共性和关键的技术难题。水溶液中Cr3+与配合剂、镀液酸度之间的配位关系复杂,深入开展Cr3+配位机理研究是加速推进三价铬镀铬工艺产业化的关键。本文综述了水溶液中Cr3+配位机理研究的进展,探讨了镀液酸度对Cr3+各种配位物的影响,指出了三价铬镀铬适宜的pH值范围,可望有助于三价铬镀铬性能优异的配位剂及其工艺的开发与研究。%Trivalent chromium electroplating, lower toxic and operating at room temperature, has drawn a great attention as one of the most challengeable processes to replace the conventional hexavalent Cr plating. The comprehensive investigation on trivalent chromium electroplating is necessary in order to improve this process. Progress on coordination mechanism of trivalent chromium ions in aqueous solution were reviewed, effects of acidity on various Cr3+complex were explored, suitable pH range in trivalent chromium plating were pointed out. it was expected to contribute to excellent complexing agents and processes development in trivalent chromium plating.

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