首页> 中文期刊>武汉理工大学学报:材料科学英文版 >Optical Characteristics of InAs Quantum Dots on GaAs Matrix by Using Various InGaAs Structures

Optical Characteristics of InAs Quantum Dots on GaAs Matrix by Using Various InGaAs Structures

     

摘要

The effects of various InGaAs layers on the structural and optical properties of InAs self-assembled quantum dots(QDs) grown by molecular-beam epitaxy (MBE) were investigated. The emission wavelength of 1317 nm was obtained by embedding InAs QDs in InGaAs/GaAs quantum well. The temperature-dependent and timed-resolved photoluminescence (TDPL and TRPL) were used to study the dynamic characteristics of carriers. InGaAs cap layer may improve the quality of quantum dots for the strain relaxation around QDs, which results in a stronger PL intensity and an increase of PL peak lifetime up to 170 K. We found that InGaAs buffer layer may reduce the PL peak lifetime of InAs QDs, which is due to the buffer layer accelerating the carrier migration. The results also show that InGaAs cap layer can increase the temperature point when the thermal reemission and nonradiative recombination contribute significantly to the carrier dynamics.

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