首页> 中文期刊> 《中国科学技术大学学报》 >磁控溅射制备多孔柱状晶ZrO2薄膜

磁控溅射制备多孔柱状晶ZrO2薄膜

         

摘要

Nanoporous columnar ZrO2 films were deposited by reactive magnetron sputtering using glancing angle deposition (GLAD) configuration. The influences of deposition angle and target-substrate distance on the optical and structural properties of ZrO2 films were investigated. It is found that the ZrO2 films fabricated using GLAD show a tilted columnar microstructure; the width of the gap between two adjacent columnar crystals is less than 100 run; the average grain size of ZrO2 films is about 10 nm; and the orientation of some grains can be changed by changing the deposition angle. In addition, with the increase in the deposition angle or/and target-substrate distance, the porosity of ZrO2 film increases while the refractive index and the deposition rate of ZrO2 film decreases. A larger deposition angle tends to increase the column inclination angle while a longer target-substrate distance tends to decrease the column inclination angle. The refractive index and porosity of ZrO2 films deposited at deposition angle of 75° are 1. 56 and 41. 7%, respectively.%采用反应磁控溅射倾斜沉积(GLAD)的方法制备了多孔柱状晶的ZrO2薄膜,研究了不同沉积角和靶基距对薄膜结构和光学性质的影响.结果表明,倾斜沉积的ZrO2薄膜具有倾斜的柱状结构,柱状晶之间存在空隙(宽度小于100 nm),平均晶粒大小约为10 nm.沉积角大小的改变在一定程度上可以改变ZrO2薄膜中某些晶粒的取向.增大沉积角和增加靶基距均可使薄膜的折射率减小、孔隙率增大、沉积速率减小,不同的是增大沉积角会增大柱状倾斜角,而增加靶基距会减小柱状倾斜角.沉积角为75°时可制备出折射率为1.56、孔隙率为41.7%的ZrO2薄膜.

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