Objective :To clarify the influence of an experimental palatal plate on the mandibular position during continuous [ n] phonation and at the physiological rest position in complete denture wearers. Methods: Ten complete denture wears volunteers were investigated. Two kinds of experimental palatal plate with a thickness of 3 mm and 5 mm (from the denture basal surface to denture polished surface) were fabricated and used for each subject. The mandibular position was recorded by a K7 mandibular kinesiograph during continuous [ n] phonation and at the physiological rest position under three conditions: wearing a palatal plate with different thickness of 3 mm, 5 mm and without a plate ( control) . The interocclusal distance both in vertical and anteroposterior direction during continuous phonation and physiological rest position under all three conditions were measured and compared. Results: Under the control condition without wearing of a plate, the mean values of interocclusal distance (IOD) during continuous [ n] phonation were ( 1. 69 ± 1. 26) mm vertically and (1. 74 ± 1. 18) mm anteroposteriorly. After insertion of the experimental plates, there was an increase in the IOD during continuous [ n] phonation, but this difference from the normal condition was not statistically significant. The mean IOD at the physiological rest position in these 2 directions were (2. 91 ±2. 28 ) mm and (2. 56 ± 1. 88) mm, respectively. After insertion of the experimental plates, there was a decrease in the IOD, with the 3 mm plate, (2.52 ±1. 88) mm vertically and (2.46 ± 1. 64) mm anteroposteriorly; with 5 mm plate, (2. 45 ± 1. 70) mm vertically and (2. 22 ± 1. 31) mm anteroposteriorly. No significant differences were found between the control and 2 experimental conditions. Conclusion: The mandibular position during continuous [n] phonation was not influenced by the experimental palatal plates and physiological rest position was also not affected by experimental palatal plates.%目的:研究不同厚度的上腭托对无牙颌患者连续发[n]音时下颌位置的影响.方法:10名无牙颌患者,平均年龄为76.4岁.每一个患者按照随机原则,在不戴上腭托(对照组)和分别戴用3 mm、5 mm的上腭托时,用K7下颌运动轨迹描记仪记录下颌的位置,包括连续发[n]音4 s时下颌的位置和下颌息止颌位.结果:不戴上腭托(对照组)连续发[n]音时,垂直向的颌间距离的平均值为(1.69±1.26)mm,前后向的平均值为(1.74±1.18)mm,戴入实验上腭托后,在垂直向和水平向的颌间距离都稍有增加,但差异无统计学意义.不戴实验上腭托(即对照组)的息止颌位时,在垂直方向和水平方向的颌间距离的平均值分别是(2.91±2.28)mm和(2.56±1.88)mm,戴入实验上腭托后,在垂直向和水平向的颌间距离都稍有减小,即戴3 mm上腭托分别为(2.52±1.88)mm和(2.46±1.64)mm;戴5 mm上腭托的颌间距离分别为(2.45±1.70)mm和(2.22±1.31)mm,但差异无统计学意义.结论:总义齿患者连续发[n]音时,戴不同厚度的上腭托对下颌的颌间距离没有显著影响;总义齿患者戴不同厚度的上腭托对下颌息止颌位没有明显影响.
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