CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP

摘要

Investigation was made of the sputtering rate in glow discharge lamp with relaion toconstituent of 25 different specimens of 6 binary systems.namely,Cr-Fe,Bi-Sb,Cu-Zn,Ag-Cu,Al-Zn and Cd-Sn.by measuring mass loss sfter each sputtering under constantAr pressure and voltage applicd.The correlation.in general,between sputtering rate andconcentration of constituent of these non-intermetallic binary alloys obeys the hyperboliclaw under steady state,that may be approximately regarded as linear correlation only oncertain special condition if the two components of the alloys with similar sputte ringrates.