NiTi形状记忆薄膜的显微结构和力学性能

摘要

NiTi形状记忆合金薄膜具有形状记忆效应,极有希望用于制造高技术领域微电子机械系统中的微型激发器.NiTi形状记忆合金薄膜在制备和使用过程中需要高品质(衬)底材.本文利用高分辨电子显微学和高分辨分析电子显微学详细研究了硅底材NiTi形状记忆合金薄膜的NiTi/Si 和NiTi/Si/SiO2 微结构体系,包括薄膜精细结构和界面反应.也研究了其显微结构和力学性能的关系.特别给出了NiTi形状记忆合金薄膜产生疲劳过程的微观过程和起因,通过高达十万个使用热循环前后样品显微结构变化的比较,发现纳米尺度上的TiNi3新相的形成导致疲劳过程的发生.如何抑制TiNi3新相形成的研究正在进行之中,这将为进一步提高NiTi形状记忆合金的使用寿命指出方向.%The microstructures of TiNi thin films prepared on silicon substrate with or without silica surface layer have been investigated using transmission electron microscopy. The results show that fatigue occurs in TiNi shape memory alloy (SMA) due to repeated and fluctuating strains during its application in greatdeal of low high temperature cycling. Presence of the precipitates identified mation from martensite to austenite, which is the working mechanism of SMA during thermal fatigue. Therefore, these precipitates result in the serious decay on SMA mechanical performance and further fracture of the SMA material.