制备工艺对HfO2薄膜抗激光损伤能力的影响

摘要

A series of films were prepared by reactive evaporation. Themicrostructure defects on film surfaces and effect of substrate cleaning procedures on laser induced damage threshold were investigated. The RMS surface roughness of uncoated and coated substrates were measured. It was shown that the coating process could increase or decrease the surface roughness and had obvious effects on damage threshold．%采用反应蒸镀法镀制了单层HfO2薄膜，观察了薄膜表面主要的微结构缺陷，研究了基片清洗工艺对薄膜损伤阈值的影响。测量了薄膜沉积前后表面粗糙度变化。结果表明：沉积工艺可以改变粗糙度，并对薄膜抗激光损伤能力有较大的影响。